JPH0410209B2 - - Google Patents

Info

Publication number
JPH0410209B2
JPH0410209B2 JP56115088A JP11508881A JPH0410209B2 JP H0410209 B2 JPH0410209 B2 JP H0410209B2 JP 56115088 A JP56115088 A JP 56115088A JP 11508881 A JP11508881 A JP 11508881A JP H0410209 B2 JPH0410209 B2 JP H0410209B2
Authority
JP
Japan
Prior art keywords
projection
wafer
pattern
exposure
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56115088A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5817446A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP56115088A priority Critical patent/JPS5817446A/ja
Publication of JPS5817446A publication Critical patent/JPS5817446A/ja
Publication of JPH0410209B2 publication Critical patent/JPH0410209B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G03F7/70333—Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56115088A 1981-07-24 1981-07-24 投影露光方法および装置 Granted JPS5817446A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56115088A JPS5817446A (ja) 1981-07-24 1981-07-24 投影露光方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56115088A JPS5817446A (ja) 1981-07-24 1981-07-24 投影露光方法および装置

Publications (2)

Publication Number Publication Date
JPS5817446A JPS5817446A (ja) 1983-02-01
JPH0410209B2 true JPH0410209B2 (en]) 1992-02-24

Family

ID=14653893

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56115088A Granted JPS5817446A (ja) 1981-07-24 1981-07-24 投影露光方法および装置

Country Status (1)

Country Link
JP (1) JPS5817446A (en])

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4869999A (en) * 1986-08-08 1989-09-26 Hitachi, Ltd. Method of forming pattern and projection aligner for carrying out the same
JP2619473B2 (ja) * 1987-06-17 1997-06-11 株式会社日立製作所 縮小投影露光方法
JPS6342122A (ja) * 1986-08-08 1988-02-23 Hitachi Ltd パタ−ン形成方法
JP2530833B2 (ja) * 1987-02-07 1996-09-04 株式会社日立製作所 ホトレジストパタ―ンの形成方法
JPH02137216A (ja) * 1988-11-17 1990-05-25 Yamaha Corp 投影露光法
JPH02137217A (ja) * 1988-11-17 1990-05-25 Yamaha Corp 投影露光法
JP3234891B2 (ja) * 1990-10-30 2001-12-04 株式会社ニコン 投影露光装置
US5343270A (en) * 1990-10-30 1994-08-30 Nikon Corporation Projection exposure apparatus
JP2705312B2 (ja) * 1990-12-06 1998-01-28 ソニー株式会社 投影露光方法
JP2654418B2 (ja) * 1993-11-17 1997-09-17 株式会社日立製作所 投影露光装置
JPH08153661A (ja) 1994-11-28 1996-06-11 Sony Corp 投影露光方法
SG110121A1 (en) 2003-09-10 2005-04-28 Asml Netherlands Bv Method for exposing a substrate and lithographic projection apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1037606B (it) * 1974-06-06 1979-11-20 Ibm Apparecchiatura ottica perfezionata utile per la fabbricazione di circuiti integrati
FR2388300A1 (fr) * 1977-04-20 1978-11-17 Thomson Csf Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant

Also Published As

Publication number Publication date
JPS5817446A (ja) 1983-02-01

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